Nano material
characterization Group Nano material
characterization Group
Department of Electronics, Information and Communication Engineering Waseda UniversityIwao OhdomariProf. Dr. |
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The contents of the Ohdomari laboratory research
1.Establishment of Pin Point
Doping Technology to a Nano-scale Semiconductor Region by Single Ion
Implantation (SII)
2. Control of an Electrical
Characteristic of Sub-micron Semiconductor Devices by Single Ion Implantation
(SII)
3. Fabrication of 1.56Tbit/in2 Ultra High-density Nano-Etchpit
Array (NEPA)
4.
Fabrication of Nano-Pyramid Array (NPA) and Control of Its Surface
Potential
5.
Nucleation and Growth of Cu Adsorbates on Hydrogen-Terminated Si(111) Surface in
Solution
6.
Nucleation Site of Cu on the Hydrogen-Terminated Si(111) Surface
7. Completion of the
Development of Molecular Dynamics Simulation Method for the Surface
Modification
8.
Completion of the Development of a Parallel PC High Speed Calculation System for
Large-scale Molecular Dynamics Calculations
9.
10. High-temperature real-time observation of surface defects induced by single ion irradiation using scanning-tunneling-microscope / ion-gun combined system
11. Immobilized Enzymes on
Modified Silicon Surface
12. Simple Fabrication of
Silicon Nanopyramids for High Performance Field Emitter Array
13. Fabrication of
Adenosine Triphosphate-Molecule Recognition Chip by Means of Bioluminous Enzyme
Luciferase
2001/05/31 webmasters@coe.waseda.ac.jp